Crucible aperture: An effective way to reduce source oxidation in oxide molecular beam epitaxy process

Chapter 3 . Gas Source Molecular Beam Epitaxy of Compound Semiconductors

This research program utilizes the chemical beam epitaxy laboratory and emphasizes the epitaxial growth of a wide variety of compound semiconductors (both Il-VI and Ill-V), as well as multilayered structures composed of II-VI/II-VI, II-VI/III-V and Ill-V/III-V heterostructures. The chemical beam epitaxy laboratory consists of two gaseous source epitaxy reactors (Il-VI dedicated and Ill-V dedica...

Chapter 3 . Gas Source Molecular Beam Epitaxy of Compound Semiconductors

Current state-of-the-art epitaxial growth techniques employ various metalorganic and hydride gases to deliver constituent species to the substrate surface, particularly high vapor pressure species such as phosphorus and sulfur. Gas source molecular beam epitaxy (GSMBE) utilizes hydride gas sources and solid elemental sources. The more conventional growth approach, molecular beam epitaxy (MBE), ...

Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy

In this paper we present the atomic-layer-by-layer oxide molecular beam epitaxy (ALL-oxide MBE) which has been recently installed in the Max-Planck Institute for Solid State Research and we report on its present status, providing some examples that demonstrate its successful application in the synthesis of different layered oxides, with particular reference to superconducting La2CuO4 and insula...

Wirelike Growth of Si on an Au/Si(111) Substrate by Gas Source Molecular Beam Epitaxy

Ultrafine Si nanowires are grown on an Au/Si(111) substrate using gas source molecular beam epitaxy. These Si wires with crosssectional dimensions between 50 nm and 2 μm grow mainly with a growth axis parallel to the <111> direction. The growth rate of nanowires is independent of their diameters, i.e., nanowires with different diameters have the same growth rate. From the dependence of source g...

Electro-Oxidation as an Effective Process for Removing Antibiotics and Persistent Organic Compounds Resistant to Biodegradation